Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Sputtering — is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin film deposition, etching and analytical techniques (see below). Physics of sputtering Physical… … Wikipedia
Sputtering — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… … Wikipedia
Pulvérisation cathodique (sputtering) — Pulvérisation cathodique La pulvérisation cathodique est une méthode de dépôt de couche mince. Sommaire 1 Principe 1.1 Synthèse de films céramiques 1.2 Instabilité électrique … Wikipédia en Français
Low-energy ion scattering — LEIS redirects here; for the Hawaiian garland see Lei (Hawaii). Low energy ion scattering spectroscopy (LEIS), sometimes referred to simply as ion scattering spectroscopy (ISS), is a surface sensitive analytical technique used to characterize the … Wikipedia
Static secondary ion mass spectrometry — Static secondary ion mass spectrometry, or static SIMS is a technique for chemical analysis including elemental composition and chemical structure of the uppermost atomic or molecular layer of a solid which may be a metal, semiconductor or… … Wikipedia
Sensitive high resolution ion microprobe — The sensitive high resolution ion microprobe (SHRIMP) is a large diameter, double focusing secondary ion mass spectrometer (SIMS). The SHRIMP is primarily used for geological and geochemical applications. It can rapidly measure the isotopic and… … Wikipedia
High Power Impulse Magnetron Sputtering — (HIPIMS, also known as High Impact Power Magnetron Sputtering and High Power Pulsed Magnetron Sputtering, HPPMS) is a method for physical vapor deposition of thin films which is based on magnetron sputter deposition. HIPIMS utilises extremely… … Wikipedia
Zerstäubungskatode — dulkinamasis jonų taikinys statusas T sritis radioelektronika atitikmenys: angl. ion sputtering target vok. Zerstäubungskatode, f; Zerstäubungstarget, n rus. мишень для ионного распыления, f pranc. cible du réacteur de pulvérisation ionique, f … Radioelektronikos terminų žodynas
Zerstäubungstarget — dulkinamasis jonų taikinys statusas T sritis radioelektronika atitikmenys: angl. ion sputtering target vok. Zerstäubungskatode, f; Zerstäubungstarget, n rus. мишень для ионного распыления, f pranc. cible du réacteur de pulvérisation ionique, f … Radioelektronikos terminų žodynas
